Delft 2010

 Detailed Programme >>>

Programme Outline  * subject to confirmation

 Monday 31st May 2010

 Tuesday 1st June 2010

 Opening Keynote: 'Extreme Ultra Violet Lithography' Dr J. Benschop, ASML, NL   

6.30pm euspen first international challenge football match

Wednesday 2nd June 2010

 Opening Keynote: 'Adaptive Optics-Current International Status' Prof. R. Munnig Schmidt, Univ. of Delft, NL 

 

Thursday 3rd June 2010

Friday 4th June 2010

Technical Company Tours:

 

Session Chairmen:

Prof. J. van Eijk, University of Delft
Dr. J. Benschop, ASML, NL
Dr. H. Bosse, PTB, DE
Dr. H. Haitjema, Mitutoyo Research Centre, NL
Prof. P. Shore, Cranfield Univesity, UK
Mr. R. Nefkens, Hembrug, NL
Prof. K. Carlisle, Lawrence Livermore National Laboratory, USA
Prof. D. Reynaerts, KU Leuven, BE
Mr. D. Arneson, Professional Instruments, US
Dr. K. Beckstette, Zeiss, DE
Mr. M. Tricard, QED Technologies, US
Prof. T. Moriwaki, Kobe University, JP
Dr. P. Subrahmanyan, Rapt Industries, US
Dr. W. T. Estler, NIST, US
Prof. H. Van Brussel, KU Leuven, BE
Prof. L. de Chiffre, Denmark Technical University, DK
Prof. S. Zelenika, University of Rijek, CR
Dr. W. Knapp, ETH, CH
Dr K. Carneiro, DFM, DK
Mr T. Peijnenburg, VDL Enabling Technologies Group, NL